ablation process

target ablation characteristics of thin films during nanosecond pulsed laser deposition in the ablation process

纳秒脉冲激光沉积薄膜过程中的烧蚀特性研究

thermal characteristics of the ablation process of thin films based on pulsed laser preparation technique

脉冲激光制膜技术烧蚀阶段的热特性研究

Target Temperature Distribution on Ablation Process with Ultrafast High-Pulse-Rate Lasers

超快脉冲激光烧蚀过程中的靶材温度分布

variation of the target absorptance and target temperature distribution before melting in the pulsed laser ablation process

靶材吸收率变化与烧蚀过程熔融前靶材温度分布

The microstructure and the ablation process of the phenolic ablator reinforced by fiberglass was studied by means of EPMA, XRF and DTA-TG.

本文采用EMPA、XRF和DTA-TG等现代分析测试手段研究了玻璃纤维增强酚醛型烧蚀材料的显微结构及其烧蚀过程。

the whole ablation process of target during the pulsed laser preparation thin films is studied.

研究了用脉冲激光制备薄膜时激光烧蚀靶材的的全过程。

Study on the microstructure and the ablation process of phenolic ablator reinforced by fiberglass

玻璃纤维增强酚醛型烧蚀材料的显微结构及其烧蚀过程研究

Finally the variety of the density of conduction band electrons in the ablation process is discussed and the experimental result with avalanche mode is interpreted.

讨论了飞秒激光照射下LiF晶体中导带电子数密度的变化规律，并解释了相应的实验结果。